SOLICITATION NOTICE
66 -- Plasma Lab 80 Plus ICP RIE System
- Notice Date
- 4/12/2007
- Notice Type
- Solicitation Notice
- Contracting Office
- N68936 Naval Air Warfare Center Weapons Division Dept.1 429 E. Bowen Rd - Stop 4015 China Lake, CA
- ZIP Code
- 93555-6108
- Solicitation Number
- N6893607T0073
- Response Due
- 5/29/2007
- Archive Date
- 12/10/2007
- Point of Contact
- Gayle Cline (760) 939-8109 John D. Watkins, john.d.watkins@navy.mil (760) 939-8158
- E-Mail Address
-
Gayle Cline
(gayle.cline@navy.mil)
- Description
- The Naval Air Warfare Center Weapons Division (NAWCWD), China Lake, CA intends to procure a quantity of one (1) Inductively Coupled Plasma Reactive Ion Etch System (ICP) on a competitive firm fixed price basis. Delivery of the Etch System is FOB destination to the Naval Air Warfare Center Weapons Division China Lake, CA 90 days after award of the contract. A portion of the specifications include but are not limited to the following: The ICP RIE system shall consist of one etch process module with the following components and capabilities. 1) Base console housing the electronic sub systems, control units, pneumatics, and turbomolecular pump. (2) Control software for operation of process, wafer handling, real time data logging of process parameters, machine status and recipe management. 3) ICP process chamber with pumping port of diameter within range of 150 to 250 mm, view port and end-point-detection ports for optical emission spectrometer and laser interferometer, ! electrical heating cartridge for heating all process chamber walls to reduce condensation of process effluents. 4) System shall have a remote high-density plasma source of at least 180 mm inside diameter with a maximum output of no less than 300 W RF power @13.56MHz, automatic matching unit that is close-coupled with the source, source to use an electrostatic shield to produce a purely inductive plasma. The system shall have an aluminum lower electrode with a diameter at least 175 mm. 5) System shall include all required tooling for etching a 4" wafer. The solicitation will be posted on the Navy Electronic Commerce Online Website at http://www.neco.navy.mil and the FEBBIZOPPS website at http://vsearch2.eps.gov/servlet/searchservlet on or about 4/27/07. The solicitation will close on or about 5/29/07. Award will be issued under the authority of the test program for commercial items (FAR 13.5). All responsible sources must be registered in the Central Contractor Registrat! ion (CCR) database at the following website: https://www.ccr.dlis.mil/ ccr/scripts/index.html. All responsible sources may submit a quotation that will be considered by the agency. Responses must include all information requested in the written Request for Quotation (RFQ). Evaluation for the award will consider price and other factors including technical capability. All responses shall be submitted in writing to the Naval Air Warfare Center Weapons Division Code 210000D, Attn: Gayle Cline, 429 E. Bowen Road, Stop 4015, China Lake, CA 93555-76108 or FAX (760) 939-8107 or (760) 939-4241, e-mail gayle.cline@navy.mil. NAICS Code = 333512 Place of Performance = N/A Set Aside = N/A NOTE: THIS NOTICE MAY HAVE POSTED ON FEDBIZOPPS ON THE DATE INDICATED IN THE NOTICE ITSELF (12-APR-2007). IT ACTUALLY APPEARED OR REAPPEARED ON THE FEDBIZOPPS SYSTEM ON 10-JUL-2007, BUT REAPPEARED IN THE FTP FEED FOR THIS POSTING DATE. PLEASE CONTACT fbo.support@gsa.gov REGARDING THIS ISSUE.
- Web Link
-
Link to FedBizOpps document.
(http://www.fbo.gov/spg/DON/NAVAIR/N68936D1/N6893607T0073/listing.html)
- Record
- SN01338805-F 20070712/070710223119 (fbodaily.com)
- Source
-
FedBizOpps Link to This Notice
(may not be valid after Archive Date)
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