MODIFICATION
66 -- RECOVERY - HIGH RATE SILICON DIOXIDE DEEP REACTIVE ION ETCHER
- Notice Date
- 1/13/2010
- Notice Type
- Modification/Amendment
- NAICS
- 334516
— Analytical Laboratory Instrument Manufacturing
- Contracting Office
- Department of Commerce, National Institute of Standards and Technology (NIST), Acquisition Management Division, 100 Bureau Drive, Building 301, Room B129, Mail Stop 1640, Gaithersburg, Maryland, 20899-1640
- ZIP Code
- 20899-1640
- Solicitation Number
- AMD-10-SS29
- Archive Date
- 2/4/2010
- Point of Contact
- Eduardo F. Baca, Support Contractor, Phone: 3019756388, Patrick K Staines, Phone: (301)975-6335
- E-Mail Address
-
eduardo.baca@nist.gov, patrick.staines@nist.gov
(eduardo.baca@nist.gov, patrick.staines@nist.gov)
- Small Business Set-Aside
- N/A
- Description
- RECOVERY - Amendment to enter administrative changes: Change 1: In the last paragraph, change the last sentence to read: The response should include all requests for information listed above. Change 2: Where the Title "High Rate Silicon Deep Reactive Ion Etcher" appears, read as "High Rate Silicon Dioxide Deep Reactive Ion Etcher". Change 3: In the Primary Point of Contact, after Eduardo Baca, add "Support Contractor." Change 4: Extend the closing date to January 20, 2010. End of Changes.
- Web Link
-
FBO.gov Permalink
(https://www.fbo.gov/spg/DOC/NIST/AcAsD/AMD-10-SS29/listing.html)
- Record
- SN02041654-W 20100115/100113235230-e0d96fb424b36552d80437ff4f046acc (fbodaily.com)
- Source
-
FedBizOpps Link to This Notice
(may not be valid after Archive Date)
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