SOURCES SOUGHT
66 -- RECOVERY -- Atom-Metrology Scanning Electron Microscope
- Notice Date
- 1/19/2010
- Notice Type
- Sources Sought
- NAICS
- 334516
— Analytical Laboratory Instrument Manufacturing
- Contracting Office
- Department of Commerce, National Institute of Standards and Technology (NIST), Acquisition Management Division, 100 Bureau Drive, Building 301, Room B129, Mail Stop 1640, Gaithersburg, Maryland, 20899-1640
- ZIP Code
- 20899-1640
- Solicitation Number
- AMD-10-SS35
- Archive Date
- 2/13/2010
- Point of Contact
- Kim S Stavish, Phone: 301-975-2672, Todd D Hill, Phone: 301-975-8802
- E-Mail Address
-
kim.stavish@nist.gov, todd.hill@nist.gov
(kim.stavish@nist.gov, todd.hill@nist.gov)
- Small Business Set-Aside
- N/A
- Description
- RECOVERY - THIS IS NOT A REQUEST FOR QUOTATIONS. INFORMATION RECEIVED WILL BE USED FOR MARKET RESEARCH PURPOSES ONLY. THIS CONTEMPLATED PROCUREMENT IS ANTICIPATED TO UTILIZE THE AMERICAN RECOVERY AND REINVESTMENT ACT (ARRA) OF 2009 FUNDING IF IT IS DETERMINED THAT RESPONSIBLE SOURCES CAN SATISFY THE REQUIREMENT. All responsible sources are encouraged to respond to this notice; however, sources that do not respond shall not be precluded from responding to any subsequent solicitation. The National Institute of Standards and Technology (NIST) seeks an atomic resolution scanning electron beam dimensional research microscope and metrology platform. Responses from responsible sources should clearly establish capability of providing Atom-Metrology Scanning Electron Research Microscopes and Metrology Platform. After results of this market research are obtained and analyzed and specifications are developed for this instrument, NIST may conduct a competitive procurement. If at least two qualified small businesses are identified during this market research stage, then any competitive procurement that results would be conducted as a small business set-aside. Requirements for the Atom-Metrology Scanning Electron Microscope (SEM) are as follows: The Atom-Metrology Scanning Electron Research Microscope and Metrology Platform is a unique reference measurement instrument sub-nanometer best resolution. This instrument incorporates advanced laser interferometry in the specimen stage to accurately track the X and Y and preferably other motions of the stage. This instrument will be used for the development and calibration of accurate length metrology reference artifacts and to provide dimensional metrology solutions on samples that can be measured by an electron beam as the probe. Additionally, dual-beam capability is desired for sample preparation, modification and characterization through slicing, and for sample fabrication down to the nanometer scale. SEMs are widely used in U.S. research, development and manufacturing, especially in the fields of nanotechnology and microelectronics where individual device sizes are now approaching few nanometers, but overall sample size can be 100 mm or greater. A modern scanning electron beam research and metrology platform is needed in order to satisfy the NIST customers' needs for length standards on large substrates (silicon wafers and photomasks) and to achieve breakthroughs in accurate metrology using scanned electron beam instrumentation. This instrument will enable improvements in the development of measurement tools and techniques for qualitative and quantitative atomic to macro scale structural characterization of materials, samples, devices and reference structures and fabrication of structures down to a few nanometer in size. Although NIST currently has the capability to perform high-resolution characterization of metal particles and semiconductor structures, it lacks the ability to perform high-accuracy three-dimensional (3D) atomic-scale characterization of these structures and samples at and below 10 nm. For these applications ultra high resolution, i.e. better than 1 nanometer imaging capability at low landing energy (< 1 keV) electron beam, is indispensable. An ultra-high resolution SEM will permit the imaging and size and shape determination of highly sensitive nanometer-size samples such as gold and other nanoparticles and various other nanostructures. Sample contamination and sample damage must be kept at negligible levels, while relevant surface information with excellent signal-to-noise ratio and contrast are required. It is desired to have a combined functionallity of a dual-beam instrument, which combines the capabilities of a SEM and a highly focused ion beam column. These together can allow for sample preparation, sample characterization through slicing, sample fabrication down to the nanometer scale. Key part of the requirements is a fast and sub-200 picometer resolution laser interferometer sample stage that allows for stage drift and vibration compensation and provide traceability at least in the X and Y direction measurements. It is desired that this sample stage will have X, Y and Z laser position measurement capability and other sample stage motions (tilt, rotation) will have position measurement by high-precision scales. Requested Information to be Included in Responses to this Notice: 1. Indicate whether your company manufactures or is an authorized reseller/business partner for an Atom-Metrology SEM of any kind and, if so, please provide complete commercial specifications for the Atom-Metrology SEM that your company manufactures or sells, including the name of the company that manufactures the Atom-Metrology SEM, where it is manufactured, and detailed functional and performance specifications that the product meets. 2. If your organization is an original equipment manufacturer of Atom-Metrology SEM, then please provide the name of company(ies) that are authorized by your organization, as the OEM, to sell your organization's Atom-Metrology SEM, as well as their addresses, and a point of contact for the company (name, phone number, fax number and email address). 3. Indicate the number of days, after acceptance of order, which is typical for delivery of Atom-Metrology SEM to the intended delivery location. 4. A complete copy of standard terms and conditions for the Atom-Metrology SEM that your organization manufactures or sells, to include, at a minimum: base warranty, available extended warranty (if offered), copy of software license(s) (if applicable), and customary payment terms. 5. Available training that can be purchased or may be included with the purchase of the Atom-Metrology SEM. 6. Customary documentation that is provided with the purchase of the Atom-Metrology SEM. 7. Describe optional items that are available for purchase for the Atom-Metrology SEM, such as consumables, spares, tools, additional components, ancillary equipment, software licenses, telephone support, etc. 8. If any of the above-referenced NIST Atom-Metrology SEM specifications appear to be unduly restrictive, then please indicate which specification you believe is unduly restrictive and indicate how you believe it could be more competitively worded such that it can be met by more than one Atom-Metrology SEM manufacturer and still meet the definition of commercial item at FAR 2.101. 9. Indicate whether modifications of the Atom-Metrology SEM currently manufactured or sold by your organization would be necessary to meet Government specifications listed in this notice and, if so, indicate whether those modifications would be considered minor modifications as described in the FAR Subpart 2.101 definition of commercial item. 10. The number of persons currently employed by your company, including parent organization and all subsidiaries (if applicable). 11. Indicate whether the Atom-Metrology SEM referenced in the response is currently available for ordering from one or more GSA Federal Supply Schedule (FSS) contracts and, if so, provide the GSA FSS contract number(s). 12. Provide any other relevant information that is not listed above which the Government should consider in developing its minimum specifications and finalizing its market research. Responses to this notice shall be sent by email to Kim Stavish, Contract Specialist, at kim.stavish@nist.gov, with cc: to Todd Hill at todd.hill@nist.gov, so that it is received at that email address no later than January 29, 2010. The responses should include responses to all 12 requests for information listed above.
- Web Link
-
FBO.gov Permalink
(https://www.fbo.gov/spg/DOC/NIST/AcAsD/AMD-10-SS35/listing.html)
- Place of Performance
- Address: TBD, United States
- Record
- SN02044523-W 20100121/100119234826-33c5f4e6d8d2de8fde9cf703f2ac1aaa (fbodaily.com)
- Source
-
FedBizOpps Link to This Notice
(may not be valid after Archive Date)
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