MODIFICATION
66 -- Atomic Force-Scanning Electrochemical Microscope-Raman Spectroscopy System
- Notice Date
- 7/15/2010
- Notice Type
- Modification/Amendment
- NAICS
- 334516
— Analytical Laboratory Instrument Manufacturing
- Contracting Office
- Department of Commerce, National Institute of Standards and Technology (NIST), Acquisition Management Division, 100 Bureau Drive, Building 301, Room B129, Mail Stop 1640, Gaithersburg, Maryland, 20899-1640
- ZIP Code
- 20899-1640
- Solicitation Number
- SB1341-10-RQ-0462
- Archive Date
- 9/30/2010
- Point of Contact
- Joni L Laster, Phone: 301-975-8397, Todd D Hill, Phone: 301-975-8802
- E-Mail Address
-
joni.laster@nist.gov, todd.hill@nist.gov
(joni.laster@nist.gov, todd.hill@nist.gov)
- Small Business Set-Aside
- N/A
- Description
- The purpose of this amendment is to address the following vendor questions and answers: Question 1: Is the Raman instrument supposed to be in an upright or inverted setup? Answer: Upright Set-up is required Question 2: Requirements mention I-V characteristics: is this in air or liquid? Is this conductive AFM or electrochemical voltammograms referenced? Answer: Air and liquid; conductive AFM and electrochemical voltammograms Question 3: What is NIST's perspective of SECM: there are several interpretations. Is this the AFM based method in which the AFM tip is used purely for imaging the surface in an EC environment, or does the tip take an active electrochemical role? Or is this referring to the non-AFM based SECM method? Answer: The tip takes an active electrochemical role Question 4: "The maximum scan range shall be at least 100 µm × 100µm. Independent tip positioning with over an area of 10 µm × 10 µm is required." Is the requirement for a dual-scanning system in which the sample and tip can both be scanned with piezos, or simply for a 100um scan range (tip or sample)? Some clarifications on the 10um tip positioning is required. Answer: NIST requires the capability to scan the stage and the tip. The tip should be placed within an area of 10 um x 10 um without having to move the stage. Question 5: "The liquid media shall include dilute acidic and basic solutions, as well as organic solvents": which solutions exactly? Answer: The solutions should include 0.1 M HClO4 and 0.1 M KCl etc. Question 6: Is there an interest in nano-mechanical mapping? Answer: No Question 7: What resolution do they want to obtain in the AFM mode? Answer: In pure AFM mode with Si probes NIST requires a spatial resolution of 0.5 nm; with SECM probes NIST requires 100 nm routine resolution and 30 nm under best conditions Question 8: Do they want to do TERS or co-located AFM/Raman? Answer: NIST requires co-located AFM/Raman. Question 9: What are the samples under study? Answer: Variety of samples from metal films including Pt and Pt alloys and oxides such as TiO2.
- Web Link
-
FBO.gov Permalink
(https://www.fbo.gov/spg/DOC/NIST/AcAsD/SB1341-10-RQ-0462/listing.html)
- Place of Performance
- Address: 100 Bureau Drive, Gaithersburg, Maryland, 20899, United States
- Zip Code: 20899
- Zip Code: 20899
- Record
- SN02206987-W 20100717/100715235200-9cfaabad152d22ca34d082185f3757fe (fbodaily.com)
- Source
-
FedBizOpps Link to This Notice
(may not be valid after Archive Date)
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