MODIFICATION
66 -- Wafer Probe Station
- Notice Date
- 6/1/2011
- Notice Type
- Modification/Amendment
- NAICS
- 334515
— Instrument Manufacturing for Measuring and Testing Electricity and Electrical Signals
- Contracting Office
- Department of Commerce, National Institute of Standards and Technology (NIST), Acquisition Management Division, 100 Bureau Drive, Building 301, Room B129, Mail Stop 1640, Gaithersburg, Maryland, 20899-1640
- ZIP Code
- 20899-1640
- Solicitation Number
- SB1341-11-RQ-0257
- Archive Date
- 7/15/2011
- Point of Contact
- Joni L Laster, Phone: 301-975-8397, Todd D Hill, Phone: 301-975-8802
- E-Mail Address
-
joni.laster@nist.gov, todd.hill@nist.gov
(joni.laster@nist.gov, todd.hill@nist.gov)
- Small Business Set-Aside
- Total Small Business
- Description
- This solicitation is hereby amended to incorporate a change to the specifications of A & B in Line Item 0001 as follows: FROM: LINE ITEM 0001: Quantity one (1) each, Wafer Probe Station that shall meet or exceed the following required specifications. Technical Specifications: (A) Electrical probing specifications: 1. The sample stage shall be equipped to accommodate partial wafers as small as 3 mm diameter and full wafers up to 100 mm (4 inch) diameter. 2. The stage shall be equipped with a vacuum chuck to fix the wafer to the sample stage. 3. The vacuum shall be provided by a quiet vacuum pump and controlled by a vacuum toggle switch. The pump shall be powered by 115 VAC, 60 Hz, provide a vacuum within the range of 30 - 35 kPa, and produce no more than 40 dB sound pressure level at 1 m. 4. The vacuum chuck surface shall be metallic and electrically isolated from ground. 5. A steel platen shall be provided on which to mount at least six and no more than 10 magnetic-base probe micropositioners. 6. The platen shall have a coarse and fine lift system to allow for rapid wafer repositioning. The coarse motion shall be controlled by a lever that raises the probes by at least 2 mm. The fine motion shall be controlled by a knob that allows continuous vertical adjustment. 7. The sample stage shall have a lateral (X-Y) range of motion of 4" X 4" to allow probing of anywhere on the wafer surface. This motion shall be controlled by a compound coaxial knob (as found on microscope stages) to allow simultaneous X-Y motion. The mechanical ratio of the knob rotation to linear travel shall allow the operator to pass the platen lift acceptance test described below under Inspections and Acceptance. 8. The probe station shall include a 2" by 2" microscope stage to allow for independent lateral movement of the stereo zoom microscope. (B) Sample imaging specifications: 1. The probe station shall include a stereo zoom microscope. 2. The microscope shall include two 10X eye pieces. 3. The zoom range shall allow an overall magnification from no less than 7X to at least 50X. Preference shall be given for more than 50X maximum overall magnification. 4. The working distance shall be greater than 100 mm. Preference shall be given for more than 100 mm working distance. 5. The microscope shall include a trinocular head with a port for attachment of a CCD camera. 6. The microscope shall be equipped with a digital camera with USB 2.0 connection for image acquisition. The camera resolution shall be at least 3 megapixels. Preference shall be given for more than 3 megapixel resolution. 7. The sample stage shall be illuminated at minimum using a fiber optic ring with light pipe and incandescent light source. Preference shall be given for LED-based light source with both ring and coaxial illumination. TO: LINE ITEM 0001: Quantity one (1) each, Wafer Probe Station that shall meet or exceed the following required specifications. Technical Specifications: (A) Electrical probing specifications: 1. The sample stage shall be equipped to accommodate partial wafers as small as 3 mm diameter and full wafers up to 100 mm (4 inch) diameter. 2. The stage shall be equipped with a vacuum chuck to fix the wafer to the sample stage. 3. The vacuum shall be provided by a quiet vacuum pump and controlled by a vacuum toggle switch. The pump shall be powered by 115 VAC, 60 Hz, provide a vacuum within the range of 30 - 35 kPa, and produce no more than 40 dB sound pressure level at 1 m. 4. The vacuum chuck surface shall be metallic and electrically isolated from ground. 5. A steel platen shall be provided on which to mount at least six and no more than 10 magnetic-base probe micropositioners. 6. The platen shall have a coarse and fine lift system to allow for rapid wafer repositioning. The coarse motion shall be controlled by a lever that raises the probes by at least 2 mm. The fine motion shall be controlled by a knob that allows continuous vertical adjustment. 7. The sample stage shall have a lateral (X-Y) range of motion of 4" X 4" to allow probing of anywhere on the wafer surface. This motion shall be controlled by a compound coaxial knob (as found on microscope stages) to allow simultaneous X-Y motion. The mechanical ratio of the knob rotation to linear travel shall allow the operator to pass the platen lift acceptance test described below under Inspections and Acceptance. 8. The probe station shall include a 2" by 2" microscope stage to allow for independent lateral movement of the stereo zoom microscope. 9. The probe station shall include four (4) probe positioners with magnetic bases (B) Sample imaging specifications: 1. The probe station shall include a stereo zoom microscope. 2. The microscope shall include two 10X eye pieces. 3. The zoom range shall allow an overall magnification from no less than 7X to at least 50X. Preference shall be given for more than 50X maximum overall magnification. 4. The working distance shall be greater than 100 mm. Preference shall be given for more than 100 mm working distance. 5. The microscope shall include a trinocular head with a port for attachment of a CCD or CMOS camera. 6. The microscope shall be equipped with a digital camera (CMOS or CCD type) with USB 2.0 connection for image acquisition. The camera resolution shall be at least 3 megapixels. Preference shall be given for more than 3 megapixel resolution. 7. The sample stage shall be illuminated at minimum using a fiber optic ring with light pipe and incandescent light source. Preference shall be given for LED-based light source with both ring and coaxial illumination. The due date for quotes remains unchanged. Responses must be received not later than 3pm EST, June 10, 2011. Only timely responses shall be considered for award.
- Web Link
-
FBO.gov Permalink
(https://www.fbo.gov/spg/DOC/NIST/AcAsD/SB1341-11-RQ-0257/listing.html)
- Place of Performance
- Address: 100 Burea Drive, Gaithersburg, Maryland, 20899, United States
- Zip Code: 20899
- Zip Code: 20899
- Record
- SN02461666-W 20110603/110601235016-c1d2f20f7a2d27fa146560124193ca26 (fbodaily.com)
- Source
-
FedBizOpps Link to This Notice
(may not be valid after Archive Date)
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