SOURCES SOUGHT
66 -- HIGH DENSITY PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION
- Notice Date
- 2/10/2012
- Notice Type
- Sources Sought
- NAICS
- 334516
— Analytical Laboratory Instrument Manufacturing
- Contracting Office
- Department of Commerce, National Institute of Standards and Technology (NIST), Acquisition Management Division, 100 Bureau Drive, Building 301, Room B129, Mail Stop 1640, Gaithersburg, Maryland, 20899-1640
- ZIP Code
- 20899-1640
- Solicitation Number
- AMD-12-SS05
- Archive Date
- 3/13/2012
- Point of Contact
- Judy K. Pace, Phone: 3019752752, Patrick K Staines, Phone: (301)975-6335
- E-Mail Address
-
judy.pace@nist.gov, patrick.staines@nist.gov
(judy.pace@nist.gov, patrick.staines@nist.gov)
- Small Business Set-Aside
- N/A
- Description
- Department of Commerce, National Institute of Standards and Technology (NIST), Acquisition Management Division, 100 Bureau Drive, Building 301, Room B129, Mail Stop 1640, Gaithersburg, MD, 20899-1640 The National Institute of Standards & Technology (NIST) seeks information from vendors that are capable of providing a commercial High Density Plasma Enhanced Chemical Vapor Deposition (HD-PECVD) system which is required to provide Center for Nanoscale Science and Technology NanoFab users higher density films at lower deposition temperatures. Our multi-user facility currently employs a standard parallel plate PECVD tool to deposit silicon dioxide, silicon nitride, amorphous silicon, and oxy-nitride films at 300 degrees Celsius. This current system uses Silane, Ammonia, Nitrous Oxide, Nitrogen and Oxygen gasses for film deposition and Sulfur Hexafluoride gas for plasma chamber cleans. NIST seeks a HD-PECVD system to replace the current tool with minimal facility change requirements and will entertain trade-in offers on our current Unaxis 790 PECVD system. The HD-PECVD system must deposit silicon dioxide, silicon nitride, amorphous silicon, and oxy-nitride films. It must be capable of running small pieces up to 8" whole Si wafers with minimal retooling and be capable of changing deposition film type with minimal chamber clean or conditioning cycles while maintaining film properties and uniformity. Additionally, we would like to add carbon based film depositions such as diamond like carbon and silicon carbide. After results of this market research are obtained and analyzed and specifications are developed for the HD-PECVD that can meet NIST's minimum requirements, NIST may conduct a competitive procurement and subsequently award a Purchase Order. If at least two qualified small businesses are identified during this market research stage, then any competitive procurement that resulted would be conducted as a small business set-aside. NIST is seeking responses from all responsible sources, including large, foreign, and small businesses. Small businesses are defined under the associated NAICS code for this effort, 334516, as those domestic sources having 500 employees or less. Please include your company's size classification and socio-economic status in any response to this notice. Companies that manufacture HD-PECVD are requested to email a detailed report/product literature to describe their capabilities to judy.pace@nist.gov no later than the response date for this sources sought notice. The literature should include proof that the specifications can be met and any other information relevant to meeting this requirement. Also, the following information is requested to be provided as part of the response to this sources sought notice: 1. Name of the company that manufactures the system components for which specifications are provided. 2. Name of company(ies) that are authorized to sell the system components, their addresses, and a point of contact for the company (name, phone number, fax number and email address). 3. Indication of number of days, after receipt of order that is typical for delivery of such systems. 4. Indication of whether each instrument for which specifications are sent to judy.pace@nist.gov are currently on one or more GSA Federal Supply Schedule contracts and, if so, the GSA FSS contract number(s). 5. Any other relevant information that is not listed above which the Government should consider in developing its minimum specifications and finalizing its market research.
- Web Link
-
FBO.gov Permalink
(https://www.fbo.gov/spg/DOC/NIST/AcAsD/AMD-12-SS05/listing.html)
- Place of Performance
- Address: 100 Bureau Drive, Gaithersburg, Maryland, 20899, United States
- Zip Code: 20899
- Zip Code: 20899
- Record
- SN02673332-W 20120212/120210233837-1f7a3bfd4f97721b487c2ef048e34b26 (fbodaily.com)
- Source
-
FedBizOpps Link to This Notice
(may not be valid after Archive Date)
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