SOURCES SOUGHT
66 -- Inductively Coupled Plasma Reactive Ion Etching (ICP-RIE) System
- Notice Date
- 8/31/2012
- Notice Type
- Sources Sought
- NAICS
- 334413
— Semiconductor and Related Device Manufacturing
- Contracting Office
- Department of the Air Force, Air Force Materiel Command, AFNWC/PKO - Kirtland (Operational Contracting Division), AFNWC/PKO Operational Contracting Division, 2000 Wyoming Blvd SE, Bldg 20604, Room B-9, Kirtland AFB, New Mexico, 87117-5606, United States
- ZIP Code
- 87117-5606
- Solicitation Number
- F2KBAD2206A004
- Archive Date
- 10/1/2012
- Point of Contact
- Jason J Evans, Phone: 5058464188, Rafaela Kovacs, Phone: 5058467691
- E-Mail Address
-
jason.evans@kirtland.af.mil, rafaela.kovacs@kirtland.af.mil
(jason.evans@kirtland.af.mil, rafaela.kovacs@kirtland.af.mil)
- Small Business Set-Aside
- N/A
- Description
- SOURCES SOUGHT SYNOPSIS. This request is an announcement for information/market research for planning purposes. The synopsis does not constitute a request for proposal, request for quote, invitation for bid nor does its issuance in any way restrict the Government as to its ultimate acquisition approach. The Air Force Nuclear Weapons Center/PKOA is seeking vendors having the capability to provide Inductively Coupled Plasma Reactive Ion Etching (ICP-RIE) System. The necessary requirements for the Inductively Coupled Plasma Reactive Ion Etching (ICP-RIE) System are as follows: • Chamber and plenum constructed from hard anodized aluminum, each machined from single block • A system configured with a minimum bottom electrode diameter of 200 mm • High conductance exhaust port with a 6-inch minimum diameter • Viewport with sapphire window • Vacuum load lock for sample insertion with gate-valve and separate pump system • ICP unit with RF generator with a minimum of 600 Watts at 13.56 MHz, and reflected power less than 5% of set-point • Automatic pressure control system with a pendulum or butterfly throttle valve • Automated system and process control electronics with touch-screen user interface • Four (4) mass flow controllers • Corrosive gas module for two mass flow controllers that includes: minimum 12 gauge gas enclosure with self-closing doors, all welded VCR plumbing, 2 mass flow controllers and automatic purge system for Cl2, BCl3 • Main chamber corrosive turbo pump with a minimum pumping rate of at least 400 liters/second; backed-up preferably by appropriately sized chemically resistant dry pump • A recirculating temperature controller / water chiller • Electrostatic chuck with helium backside cooling, capable of processing at least 2-in diameter wafer • Heater/chiller for temperature control of bottom chuck ranging from at least 40C to 150C • Laser endpoint detection system • Emergency-off circuitry The North American Industry Classification System (NAICS) code is 334413, Semiconductor and Related Device Manufacturing; Size Standard, 500 employees. The Federal Stock Class (FSC) is 6640, Laboratory Equipment and Supplies. Firms responding to this announcement should be registered in the System for Award Management (SAM) and should include company name, cage code, point of contact and address. Please specify the manufacturer of the (ICP-RIE) System you are able to provide. The Government reserves the right to consider the acquisition for the 8(a) program based upon responses received to this Sources Sought announcement.
- Web Link
-
FBO.gov Permalink
(https://www.fbo.gov/spg/USAF/AFMC/377CONSKOC/F2KBAD2206A004/listing.html)
- Place of Performance
- Address: KIRTLAND AFB, Albuquerque, New Mexico, 87117, United States
- Zip Code: 87117
- Zip Code: 87117
- Record
- SN02863987-W 20120902/120831235250-c8ebe2a97e18ce7d388f3edbc18c078a (fbodaily.com)
- Source
-
FedBizOpps Link to This Notice
(may not be valid after Archive Date)
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