SOURCES SOUGHT
66 -- Silicon Sublimation Cell
- Notice Date
- 7/1/2016
- Notice Type
- Sources Sought
- NAICS
- 334516
— Analytical Laboratory Instrument Manufacturing
- Contracting Office
- Department of Commerce, National Institute of Standards and Technology (NIST), Acquisition Management Division, 100 Bureau Drive, Building 301, Room B130, Gaithersburg, Maryland, 20899-1410, United States
- ZIP Code
- 20899-1410
- Solicitation Number
- AMD-SS16-04778
- Archive Date
- 7/23/2016
- Point of Contact
- Christopher R. McGucken, Phone: (301) 975-8249
- E-Mail Address
-
christopher.mcgucken@nist.gov
(christopher.mcgucken@nist.gov)
- Small Business Set-Aside
- N/A
- Description
- TITLE: Silicon Sublimation Cell OPDIV: NIST, Physical Measurement Laboratory (PML) This is a SOURCES SOUGHT NOTICE to determine the availability of potential businesses in accordance with FAR 7.104(d). The potential business will need to demonstrate the capability to perform all facets of the work described below. The sole intent of this Sources Sought Notice is to obtain capabilities for set-aside and procurement planning purposes. This is not an invitation for bid, request for proposal, or other solicitation, and in no way obligates the National Institute of Standards and Technology (NIST) to award a contract. BACKGROUND The National Institute of Standards and Technology (NIST), Semiconductor and Dimensional Metrology Division (SDMD) provides leadership in conducting research in the areas of dimensional, nanometer-scale, surface, and acoustic pressure metrology, accelerometry, silicon Complementary Metal-Oxide Semiconductor (CMOS) technology, Micro-Electro Mechanical Systems (MEMS), power electronics, nanoelectronics, and flexible/printed electronics. The atom based laboratory is developing the capability for fabricating atomic scale devices based on atomically precise lithography and selective dopant placement. The preparation chamber in one of the ultra-high vacuum systems is being modified to incorporate a thin film deposition system for monitoring and controlling the Si sublimation epitaxial overgrowth to encapsulate the dopant layer of phosphorous in silicon. The deposition system will also help us to perform epitaxial growth experiments to optimize parameters for quality overlayer growth. To meet this objective, NIST is seeking sources capable of providing a silicon sublimation source to evaporate silicon from an intrinsic silicon filament. CONTRACTOR REQUIREMENTS To meet the purpose and objective of this requirement, the Contractor shall provide documentation demonstrating the capability to provide one (1) silicon sublimation cell. In addition, the offered system shall be capable of meeting or exceeding the salient characteristics as follows: Shall have high purity single crystal silicon shields that cover all the metallic parts which are facing the target substrate. No heating of metal part is acceptable as it can affect the purity of silicon deposition Shall be able to have typical deposition/growth rates lower than 2 Angstroms per minute Maximum deposition rate greater than 5Angstroms/min at a distance of 100mm. Shall have preheating mechanisms for intrinsic silicon filament sublimation. Must have a water cooled shroud to dissipate heat and protect the UHV system from silicon coating. Shall be equipped with a shutter. Shall be equipped with a controller and power supply. Supplied system shall be able to operate from 115 VAC, 60 Hz electrical power. Must be UHV compatible (<5 x 10^-11 Torr materials), shall be able to withstand at least 200 degrees Celsius during vacuum processing, and shall be equipped with a flange to be mounted on UHV system. Shall have a thermocouple to measure the temperature of the sublimation cell and to calibrate sublimation flux. Trade and Service 1. Vendors should include information regarding warranty availability, duration and coverage. Capability statements must demonstrate the minimum requirements outlined above. Please address each in the order listed above. Please provide the follow Business information: 1. DUNS Number 2. Company Name 3. Company Address. 4. Company Point of Contact, phone number and email address 5. Type of company under NAICS, as validated via the System for Award Management (SAM). Additional information on NAICS codes can be found at www.sba.gov. Any potential government contract must be registered on the SAM located at http://www.sam.gov/index.asp. 6. Corporate structure (corporation, LLC, sole proprietorship, partnership, limited liability partnership, professional corporation, etc.); 7. Current GSA Schedules appropriate to this Sources Sought 8. Current Government Wide Agency Contracts (GWACs) 9. Point of Contact, phone number and email address of individuals who can verify the demonstrated capabilities identified in the responses. 10. Place of manufacture of the proposed solution. Interested parties having the capabilities necessary to provide the stated requirements may submit capability statements via email or regular mail to the point of contact listed below. Responses shall be limited to 10 pages. Responses must be received not later than 3:00PM Eastern Time, July 8th, 2016. Capability statements will not be returned and will not be accepted after the due date. Documentation should be emailed to: Christopher.McGucken@nist.gov
- Web Link
-
FBO.gov Permalink
(https://www.fbo.gov/spg/DOC/NIST/AcAsD/AMD-SS16-04778/listing.html)
- Record
- SN04169752-W 20160703/160701234128-a9f48cb9db9b5bf3b24f70b079f18947 (fbodaily.com)
- Source
-
FedBizOpps Link to This Notice
(may not be valid after Archive Date)
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