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SAMDAILY.US - ISSUE OF APRIL 17, 2020 SAM #6714
SOLICITATION NOTICE

A -- Recessed SEM Pin Stub Sample Mount

Notice Date
4/15/2020 1:23:18 PM
 
Notice Type
Solicitation
 
NAICS
54138 —
 
Contracting Office
BATTELLE ENERGY ALLIANCE�DOE CNTR Idaho Falls ID 83415 USA
 
ZIP Code
83415
 
Solicitation Number
BA-1126
 
Response Due
4/30/2020 2:00:00 PM
 
Archive Date
05/15/2020
 
Point of Contact
Kala Majeti, Phone: 2488778866, Andrew Rankin
 
E-Mail Address
suryakala.majeti@inl.gov, andrew.rankin@inl.gov
(suryakala.majeti@inl.gov, andrew.rankin@inl.gov)
 
Description
TECHNOLOGY LICENSING OPPORTUNITY Recessed SEM Pin Stub Sample Mount �For companies working in scanning electron microscopy, gamma spectrometry, or transmission electron microscopy sample preparation who are dissatisfied with the cost of re-preparing samples to fit the instrument needs. This technology is an SEM stub based met mount to work with the configuration of any optical or electron microscope that provides superior sample preparation with reduced time, waste, and cross-contamination. Opportunity:�� Idaho National Laboratory (INL), managed and operated by Battelle Energy Alliance, LLC (BEA), is offering the opportunity to enter into a license and/or collaborative research agreement to commercialize the SEM stub based met mount. � Overview:��� ����This technology is a new SEM stub based met mount for working with optical or electron microscope sample preparation. Traditional metallographic mounts are not dimensionally ideal for current microanalysis techniques. Currently, the practice in industry is to prepare the met mount and cut the sample from it, then adhere it to the SEM stub. INL�s new method will save personnel time and reduce processing waste by transferring to a new stub after final polishing. � Description:�� �INL�s SEM stub based met mount is a brass met mount with a removable recessed SEM stub designed to maintain the surface finish, especially with radiological samples. The mount can travel from the polisher to the analysis instruments as the whole brass mount, or the SEM stub with the epoxy mounted sample can be removed and placed on the instrument stages. The stub is held in the brass mount with a ball detent pressed into a groove milled on the post of the SEM stub and the tolerance between the stub and mount is small enough to hold with light friction. Benefits:��� ������Benefits include: Save personnel time Reduce processing waste Cost reductions Safety improvements Simple design Easy to machine materials Very basic geometry No special tooling needed for production High turnout possible Can be modified upon request to accommodate specialized sample geometries Reduced/eliminated need for grounding when characterizing using electron microscopy Ability for a sample to travel from mounting/sample preparation to any number of characterization techniques without ever having to be remounted or resized High compatibility Applications:� �Applications include: Broad Applications: metallographic sample preparation and microanalysis Met mount for a metallographic sample embedded in the electron microscopy industry standard SEM stub Compatible with all commercially available SEM/FIB/EPMA stages and holders Development Status:� TRL 7. This technology is actively in use at INL for irradiated samples. INL is seeking to license the above intellectual property to a company with a demonstrated ability to bring such inventions to the market. Exclusive rights in defined fields of use may be available. Please visit Technology Deployment�s website at https://inl.gov/inl-initiatives/technology-deployment for more information on working with INL and the industrial partnering and technology transfer process. Companies interested in learning more about this licensing opportunity should contact Kala Majeti at td@inl.gov or 248-877-8866.
 
Web Link
SAM.gov Permalink
(https://beta.sam.gov/opp/88000fa021ea45259a1d5d6315f0d2de/view)
 
Place of Performance
Address: Idaho Falls, ID 83401, USA
Zip Code: 83401
Country: USA
 
Record
SN05621701-F 20200417/200415230155 (samdaily.us)
 
Source
SAM.gov Link to This Notice
(may not be valid after Archive Date)

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