SAMDaily.us | MOD | 36 | Metal Etch Inductively Coupled Plasma Reactive Ion Etching (ICP - RIE) Tool

SAMDAILY.US - ISSUE OF NOVEMBER 11, 2020 SAM #6922
MODIFICATION

36 -- Metal Etch Inductively Coupled Plasma Reactive Ion Etching (ICP - RIE) Tool

Notice Date: 11/9/2020 1:17:11 PM
Notice Type: Justification
NAICS: 333242 — Semiconductor Machinery Manufacturing
Contracting Office: NAVAL RESEARCH LABORATORY WASHINGTON DC 20375-5328 USA
ZIP Code: 20375-5328
Solicitation Number: N00173-20-Q-TS02
Archive Date: 12/09/2020
Point of Contact: Todd Schwartz
E-Mail Address: todd.schwartz@nrl.navy.mil
(todd.schwartz@nrl.navy.mil)
Award Number: N0017320P2031
Award Date: 09/30/2020
Web Link: SAM.gov Permalink
(https://beta.sam.gov/opp/acfa10f3c6d944e4922fe1fb0e005f42/view)
Place of Performance: Address: Washington, DC 20375, USA; Zip Code: 20375; Country: USA
Record: SN05849055-F 20201111/201109230137 (samdaily.us)
Source: SAM.gov Link to This Notice
(may not be valid after Archive Date)

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