SAMDaily.us | SRCSGT | 66 | Inductively Coupled Plasma Enhanced Chemical Vapor Deposition (ICP-PECVD) or High-Definition Plasma Enhanced Chemical Vapor Deposition (HD-PECVD).

SAMDAILY.US - ISSUE OF NOVEMBER 09, 2022 SAM #7649
SOURCES SOUGHT

66 -- Inductively Coupled Plasma Enhanced Chemical Vapor Deposition (ICP-PECVD) or High-Definition Plasma Enhanced Chemical Vapor Deposition (HD-PECVD).

Notice Date: 11/7/2022 4:29:14 AM
Notice Type: Sources Sought
NAICS: 333242 — Semiconductor Machinery Manufacturing
Contracting Office: DEPT OF COMMERCE NIST GAITHERSBURG MD 20899 USA
ZIP Code: 20899
Solicitation Number: NIST-SS23-CHIPS-0026
Response Due: 12/6/2022 9:00:00 AM
Point of Contact: Forest Crumpler, Tracy Retterer
E-Mail Address: forest.crumpler@nist.gov, Tracy.retterer@nist.gov
(forest.crumpler@nist.gov, Tracy.retterer@nist.gov)
Description: THIS IS A SOURCES SOUGHT NOTICE. PLEASE SEE ATTACHMENT�NIST-SS23-CHIPS-0026 FOR THE COMPLETE NOTICE DETAILS.�
Web Link: SAM.gov Permalink
(https://sam.gov/opp/3bdd4290e3fb4fe69f0d12ed1a6ef8cb/view)
Place of Performance: Address: Boulder, CO 80305, USA; Zip Code: 80305; Country: USA
Record: SN06511907-F 20221109/221107230103 (samdaily.us)
Source: SAM.gov Link to This Notice
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