SOLICITATION NOTICE
66 -- Ion Beam Etch System
- Notice Date
- 11/21/2024 9:02:24 AM
- Notice Type
- Solicitation
- NAICS
- 333242
— Semiconductor Machinery Manufacturing
- Contracting Office
- ARGONNE NATL LAB - DOE CONTRACTOR Lemont IL 60439 USA
- ZIP Code
- 60439
- Solicitation Number
- 4-B175-Q-00762-00
- Response Due
- 12/2/2024 9:59:00 PM
- Archive Date
- 12/02/2024
- Point of Contact
- Jenna Doria-Garner, Phone: 6302526988
- E-Mail Address
-
jdoria@anl.gov
(jdoria@anl.gov)
- Description
- Argonne National Laboratory is looking to source one(1) Infinity RM Ion Beam Etch System. Please see Specifications and Statement of Work, ""Ion Beam Etch System"" dated 09/17/2024 for further details. If able to provide this system, please provide and address the following by 12/02/2024, 11:59 PM CST. All clarifying questions must be submitted to jdoria@anl.gov by 09/24/2024, 5:00 PM CST Executed ANL-70 Request for Quotation (Signed on Page 1) Completed ANL-70B Form Proposal Quote to process two (2) samples Lead Time Country of Origin for each item Review and acceptance of the ANL-71 COM Terms and Conditions Review of Infinity RM Ion Beam Etch System Specifications, dated 11/21/2024 Review of the Infinity RM Ion Beam Etch System SOW, dated 09/17/2024 Review Instructions for Bidders, dated 09/17/2024 Addendum 0001 - Sample Clarification (Review and Sign) Addendum 0002 - Additional Clarification (Review and Sign) Addendum 0002 - Extend proposal due date and provide updated technical specification (Review and Sign) Note - Before making a final decision, the laboratory will send two (2) samples to acceptable offerors to be processed and tested to confirm capabilities.
- Web Link
-
SAM.gov Permalink
(https://sam.gov/opp/0fe5a1873723444e8b794132e8fb8b26/view)
- Place of Performance
- Address: USA
- Country: USA
- Country: USA
- Record
- SN07272513-F 20241123/241121230116 (samdaily.us)
- Source
-
SAM.gov Link to This Notice
(may not be valid after Archive Date)
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