Advanced Research Projects Agency (ARPA), Contracts Management Office (CMO), 3701 North Fairfax Drive, Arlington, VA 22203-1714

A -- PROTOTYPE PROJECTION ELECTRON-BEAM LITHOGRAPHY SYSTEM POC ELAINE ELY, Contracting Officer, FAX: (703) 696-2208. The Advanced Research Projects Agency requires the development of a prototype, projection electron-beam lithography system consisting of an exposure tool, a reticle, and a resist process. Specific emphasis will be on the design, fabrication, and demonstration of a system with a throughput of at least 10 wafers per hour and capable of producing devices with critical dimensions no larger than 0.18 micrometers. Under the authority of 10 USC 2304 (c) (1), ARPA intends to negotiate solely with AT&T, Murray Hill, NJ for this effort based upon the contractor's completed feasibility demonstration of this system under a prior contract. The contractor possesses a combination of support equipment, broad lithography expertise, and technical staff with expertise in projection electron-beam lithography that is unique to this contractor and essential for the completion of the task in a timely and economical manner. The period of performance is estimated at four years, including options. The Government estimates that a 10 man-year level-of-effort is required for this cost-share effort. As set forth in CBD Note 22, all interested parties may identify their interest and capability to respond to the requirement. This notice of intent is not a request for competitive proposals. Capability statements received within forty-five days after date of publication of this synopsis will be considered by the Government. A determination by the Government not to compete this requirement based upon responses to this notice is solely within the discretion of the Government. Information received will be considered solely for the purpose of determining whether to conduct a competitive procurement for this effort. (0038)

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