Department of Commerce, Mountain Administrative Support Center, Procurement Division, MC3, 325 Broadway, Boulder, CO 80303-3328

36 -- PHOTORESIST COATER/DEVELOPER SYSTEM SOL 52RANB50C100 DUE 072795 POC Procurement Technicians, (303) 497-3221 The National Institute of Standards and Technology (NIST) has a requirement for a complete, ready-to-use photoresist coater/developer system capable of handling 50-150 mm wafers. The coater/developer will be used in a superconducting thin-film electronics clean room facility for large scale integration wafer fabrication. The unit shall contain both a solvent/photoresist dispense spinner station, as well as all electronics, pumps, and plumbing. Thickness uniformity across the substrate, thickness repeatability from run to run, and control of streaking, particles, and comets in the resist layer are of paramount importance. The photoresist developer station shall incorporate an ultrasonic dispersion spray capable of submicron feature definition in developed resist. Due to space and cleanliness constraints, the system must be in a single cabinet fitted with covers and an adequate down flow exhaust. Each station shall be independently programmable and electronically controlled. See Numbered Note 1. (0151)

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